HomeComparative Analysis of Ferroelectric Domain Wall Motion Under Cycling Stress of HfZrO2 Fabricated by Thermal and Plasma-Enhanced Atomic Layer Depositions
HomeComparative Analysis of Ferroelectric Domain Wall Motion Under Cycling Stress of HfZrO2 Fabricated by Thermal and Plasma-Enhanced Atomic Layer Depositions
Comparative Analysis of Ferroelectric Domain Wall Motion Under Cycling Stress of HfZrO2 Fabricated by Thermal and Plasma-Enhanced Atomic Layer Depositions
기간
2024
참가자
Sangwoo Ryu
대회명
Solid-State Devices and Materials
Comparative Analysis of Ferroelectric Domain Wall Motion Under Cycling Stress of HfZrO2 Fabricated by Thermal and Plasma-Enhanced Atomic Layer Depositions