Comparative analysis of ferroelectric domain wall motion under cycling stress of HfZrO2 fabricated by thermal and plasma-enhanced atomic layer depositions
저자
Ryun-Han Koo et al.
저널 정보
The Journal of Chemical Physics
출간연도
2025
Comparative analysis of ferroelectric domain wall motion under cycling stress of HfZrO2 fabricated by thermal and plasma-enhanced atomic layer depositions