Comparative analysis of ferroelectric domain wall motion under cycling stress of HfZrO2 fabricated by thermal and plasma-enhanced atomic layer depositions
저자
Sangwoo Ryu et al.
저널 정보
The Journal of Chemical Physics
출간연도
2025
Comparative analysis of ferroelectric domain wall motion under cycling stress of HfZrO2 fabricated by thermal and plasma-enhanced atomic layer depositions