Home Interlayer engineering for enhanced ferroelectric tunnel junction operations in HfOx-based metal-ferroelectric-insulator-semiconductor stack
저자
Kyung Kyu Min et al.
저널 정보
Nanotechnology
출간연도
2021
링크
https://doi.org/10.1088/1361-6528/ac1e50
Interlayer engineering for enhanced ferroelectric tunnel junction operations in HfOx-based metal-ferroelectric-insulator-semiconductor stack