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서울대학교 이종호 교수님 연구실Semiconductor Materials and Devices Laboratory

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Home Investigation of Gate Etch Damage at Metal/High-k Gate Dielectric Stack Through Random Telegraph Noise in Gate Edge Direct Tunneling Current

Home Investigation of Gate Etch Damage at Metal/High-k Gate Dielectric Stack Through Random Telegraph Noise in Gate Edge Direct Tunneling Current

Investigation of Gate Etch Damage at Metal/High-k Gate Dielectric Stack Through Random Telegraph Noise in Gate Edge Direct Tunneling Current

저자

Heung-Jae Cho et al.

저널 정보

IEEE Electron Device Letters

출간연도

2011

링크

https://doi.org/10.1109/LED.2011.2106108

Investigation of Gate Etch Damage at Metal/High-k Gate Dielectric Stack Through Random Telegraph Noise in Gate Edge Direct Tunneling Current