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서울대학교 이종호 교수님 연구실Semiconductor Materials and Devices Laboratory

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Home Study on the Oxide Trap Distribution in a Thin Gate Oxide from Random Telegraph Noise in the Drain Current and the Gate Leakage Current

Home Study on the Oxide Trap Distribution in a Thin Gate Oxide from Random Telegraph Noise in the Drain Current and the Gate Leakage Current

Study on the Oxide Trap Distribution in a Thin Gate Oxide from Random Telegraph Noise in the Drain Current and the Gate Leakage Current

저자

Heung-Jae Cho et al.

저널 정보

Journal Korean Physical Society

출간연도

2011

링크

https://doi.org/10.3938/jkps.58.1518

Study on the Oxide Trap Distribution in a Thin Gate Oxide from Random Telegraph Noise in the Drain Current and the Gate Leakage Current