Home Under Field Oxide Dopant Enhancement (UFDE) for CMOS and BiCMOS Technology
저자
Jong-Ho Lee et al.
저널 정보
Japanese Journal of Applied Physics
출간연도
1990
링크
https://doi.org/10.1143/JJAP.29.L2292
Under Field Oxide Dopant Enhancement (UFDE) for CMOS and BiCMOS Technology
