Investigation of Device Performance for Fin Angle Optimization in FinFET and Gate-All-Around FETs for 3 nm-Node and Beyond
저자
Soyoun Kim et al.
저널 정보
IEEE Transactions on Electron Devices
출간연도
2022
Investigation of Device Performance for Fin Angle Optimization in FinFET and Gate-All-Around FETs for 3 nm-Node and Beyond