Professor Jong-Ho Lee was selected by National Academy of Engineering of Korea (NAEK, or 한국공학한림원 in Korean) as the recipient of Young Career Award on the 19th NAEK award ceremony in March 2015. NAEK, the most prestigious public institution in Korea to promote engineering research, has been holding an annual award ceremony since its establishment in 1995 to recognize talented young engineers and encourage them to accelerate their research and development in variety of engineering fields. On the 19th NAEK ceremony, Professor Lee has been awarded the Young Career Award with a medal for his invention of 3-dimensional (3D) Bulk FinFET technology. Professor Lee's 3D Bulk FinFET technology dramatically boosted productivity effectiveness of nanoscaled transistors over those the Silicon-On-Insulator (SOI) wafers and now becomes the single tech node incorporated in the state-of-the-art nanoscaled transistor devices such as in 14nm tech node.