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서울대학교 이종호 교수님 연구실Semiconductor Materials and Devices Laboratory

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Home Comparison of Low-Frequency Noise in Channel and Gate-Induced Drain Leakage Currents of High-k nFETs

Home Comparison of Low-Frequency Noise in Channel and Gate-Induced Drain Leakage Currents of High-k nFETs

Comparison of Low-Frequency Noise in Channel and Gate-Induced Drain Leakage Currents of High-k nFETs

저자

Ju-Wan Lee et al.

저널 정보

IEEE Electron Device Letters

출간연도

2010

링크

https://doi.org/10.1109/LED.2010.2058839

Comparison of Low-Frequency Noise in Channel and Gate-Induced Drain Leakage Currents of High-k nFETs