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서울대학교 이종호 교수님 연구실Semiconductor Materials and Devices Laboratory

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Home Formation of Ge nanocrystals in a silicon dioxide layer using pulsed plasma-immersion ion implantation

Home Formation of Ge nanocrystals in a silicon dioxide layer using pulsed plasma-immersion ion implantation

Formation of Ge nanocrystals in a silicon dioxide layer using pulsed plasma-immersion ion implantation

저자

Young Min Kim et al.

저널 정보

Microelectronic Engineering

출간연도

2009

링크

https://doi.org/10.1016/j.mee.2008.12.096

Formation of Ge nanocrystals in a silicon dioxide layer using pulsed plasma-immersion ion implantation